LV

Laurent S. Vesier

RH Rohm And Haas Electronic Materials Cmp Holdings: 1 patents #157 of 239Top 70%
📍 Bear, DE: #172 of 286 inventorsTop 65%
🗺 Delaware: #4,431 of 7,163 inventorsTop 65%
Overall (All Time): #3,427,378 of 4,157,543Top 85%
1
Patents All Time

Issued Patents All Time

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
7101275 Resilient polishing pad for chemical mechanical polishing John V. H. Roberts 2006-09-05