AU

Akane Uehara

RH Rohm And Haas Electronic Materials Cmp Holdings: 2 patents #101 of 239Top 45%
Overall (All Time): #1,718,949 of 4,157,543Top 45%
2
Patents All Time

Issued Patents All Time

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
12330261 Offset pore poromeric polishing pad Wei-Wen Tsai, Katsumasa Kawabata, Hui Bin Huang, Yosuke Takei 2025-06-17
11667061 Method of forming leveraged poromeric polishing pad Wei-Wen Tsai, Katsumasa Kawabata, Hui Bin Huang, Yosuke Takei 2023-06-06