Issued Patents All Time
Showing 26–37 of 37 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8039403 | Thin film transistor, method of manufacturing same, display device, method of modifying an oxide film, method of forming an oxide film, semiconductor device, method of manufacturing semiconductor device, and apparatus for manufacturing semiconductor device | Shigeki Imai, Kazuhiko Inoguchi | 2011-10-18 |
| 7595230 | Thin film transistor, method of manufacturing same, display device, method of modifying an oxide film, method of forming an oxide film, semiconductor device, method of manufacturing semiconductor device, and apparatus for manufacturing semiconductor device | Shigeki Imai, Kazuhiko Inoguchi | 2009-09-29 |
| 7204577 | Waste liquid treating device and liquid ejecting apparatus incorporating the same | Masatomo Kanamitsu, Naruhiko Katagiri, Hajime Wada, Keisuke Haba, Midori Araya +6 more | 2007-04-17 |
| 7157383 | Method for forming silicon dioxide film on silicon substrate, method for forming oxide film on semiconductor substrate, and method for producing semiconductor device | — | 2007-01-02 |
| 6739777 | Printer and roll-shaped printing medium therefor | Masahiro Uehara | 2004-05-25 |
| 6693665 | System and apparatus for facilitating printing of images from an electronic camera | Mitsuyoshi Shindo, Hideki Wanami, Kiyotaka Dochi | 2004-02-17 |
| 6593164 | Silicon photoelectric conversion device, method of manufacturing the same and method of processing the same | Hideomi Koinuma | 2003-07-15 |
| 6433269 | Silicon photoelectric conversion device, method of fabricating the same and method of processing the same | Hideomi Koinuma | 2002-08-13 |
| 6265327 | Method for forming an insulating film on semiconductor substrate surface and apparatus for carrying out the method | Kenji Yoneda | 2001-07-24 |
| 6221788 | Semiconductor and a method for manufacturing an oxide film on the surface of a semiconductor substrate | Kenji Yoneda, Takashi Namura | 2001-04-24 |
| 6022813 | Method and apparatus for manufacturing semiconductor devices | Kenji Yoneda | 2000-02-08 |
| 5100519 | Method of trapping ion in silicon oxide film or silicon oxy-nitride film | Hiroshi Tsubomura | 1992-03-31 |