Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12128117 | Method for manufacturing porous inorganic particle and light-reflecting composition comprising porous inorganic particle | Yan Li, Soojin Lee, Yongjin Kim, Yi-Rang Lim, Seung Hyun Kim | 2024-10-29 |
| 11623971 | Freestanding ion gel and method for preparing the same | Min Jae Lee, Tae Hui Kang, Yeon Ho Ahn, Duk Joon Kim | 2023-04-11 |
| 11530909 | Fiber composite and preparing method of the same | Chang Hyun PANG, Ji-Sun Kim, Da Wan KIM, Si Yeon Jang | 2022-12-20 |
| 11390530 | Method for preparing porous inorganic particles | Yan Li, Hyunsuk Lee, Jaewon Yoo, Yongjin Kim, Yi-Rang Lim +1 more | 2022-07-19 |
| 10562781 | Angle-independent colloidal particles-based structure and method for producing the same | Seung Hyun Kim | 2020-02-18 |
| 9899116 | Silver nanowire conductive film and method of fabricating the same | Hyun Suk Jung, Dong-Jun Lee, Yun Jin An | 2018-02-20 |
| 9718132 | Manufacturing method of spherical gold (Au) nanoparticles and spherical gold (Au) nanoparticle manufactured by using the same | Gaehang Lee, You-Jin Lee, Dong Kwan Kim | 2017-08-01 |
| 9302916 | Method for preparing rod-like silica fine particles including carbon | Sang-Young Kim, Se Kim, Seung Hyun Kim | 2016-04-05 |
| 8652967 | Adjuvant for controlling polishing selectivity and chemical mechanical polishing slurry comprising the same | Jong Pil Kim, Jung Hee Lee, Kwang Ik Moon, Chang Bum Ko, Soon-Ho Jang +2 more | 2014-02-18 |
| 8163650 | Adjuvant for controlling polishing selectivity and chemical mechanical polishing slurry comprising the same | Jong Pil Kim, Jung Hee Lee, Kwang Ik Moon, Chang Bum Ko, Soon-Ho Jang +2 more | 2012-04-24 |
| 8147711 | Adjuvant for controlling polishing selectivity and chemical mechanical polishing slurry | Jung Hee Lee, Jong Pil Kim, Kwang Ik Moon, Chang Bum Ko, Soon-Ho Jang +2 more | 2012-04-03 |
| 8062395 | Adjuvant for CMP slurry | Jong Pil Kim, Young Jun Hong | 2011-11-22 |
| 7674716 | Adjuvant for chemical mechanical polishing slurry | Jong Pil Kim, Jung Hee Lee, Jeong Jin Hong, Young Jun Hong, No Ma Kim +1 more | 2010-03-09 |