| 11652100 |
Semiconductor device and method of manufacturing the same |
Hiroyoshi KUDOU, Taro Moriya |
2023-05-16 |
| 10600904 |
Semiconductor device |
Hiroyoshi KUDOU, Satoru TOKUDA |
2020-03-24 |
| 9954095 |
Semiconductor device and method of manufacturing same |
Taro Moriya, Hiroyoshi KUDOU |
2018-04-24 |
| 9184285 |
Semiconductor device with gate electrodes buried in trenches |
Hiroaki Katou, Hiroyoshi KUDOU, Taro Moriya |
2015-11-10 |
| 9029953 |
Semiconductor device and manufacturing method thereof |
Hiroaki Katou, Taro Moriya, Hiroyoshi KUDOU |
2015-05-12 |
| 8969150 |
Semiconductor device and method for manufacturing the same |
Hiroaki Katou, Taro Moriya, Hiroyoshi KUDOU |
2015-03-03 |
| 8803226 |
Semiconductor device and method for manufacturing the same |
Hiroaki Katou, Taro Moriya, Hiroyoshi KUDOU |
2014-08-12 |
| 8089165 |
Device comprising electrode pad |
Taro Moriya, Yasutaka Nakashiba, Masayuki Furumiya |
2012-01-03 |
| 7842979 |
Solid-state imaging device and method of driving the same |
Hiroyoshi KUDOU, Junichi Yamamoto, Fumiaki Futamura |
2010-11-30 |
| 7547976 |
Electrode pad arrangement with open side for waste removal |
Taro Moriya, Yasutaka Nakashiba, Masayuki Furumiya |
2009-06-16 |
| 7514729 |
Solid-state imaging device and method of driving the same |
Hiroyoshi KUDOU, Junichi Yamamoto, Fumiaki Futamura |
2009-04-07 |
| 6194242 |
Fabrication of solid-state imaging device having no transfer error of the signal charge from vertical horizontal charge-transfer section |
— |
2001-02-27 |
| 6114717 |
Solid-state imaging device having no transfer error of the signal charges from vertical horizontal charge-transfer section |
— |
2000-09-05 |
| 5567632 |
Method for fabricating solid state image sensor device having buried type photodiode |
Yasutaka Nakashiba |
1996-10-22 |
| 5258608 |
Solid-state imaging device with anti-reflective layers of amorphous silicon and insulating silicon |
— |
1993-11-02 |