TP

Thomas R. Pampalone

RC Rca: 15 patents #42 of 1,739Top 3%
HC Hoechst Celanese: 2 patents #300 of 871Top 35%
AH American Hoechst: 1 patents #61 of 142Top 45%
GE: 1 patents #19,878 of 36,430Top 55%
Overall (All Time): #242,886 of 4,157,543Top 6%
19
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
5143814 Positive photoresist compositions with o-quinone diazide, novolak and propylene glycol alkyl ether acetate 1992-09-01
5066561 Method for producing and using a positive photoresist with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate 1991-11-19
4810619 Photolithography over reflective substrates comprising a titanium nitride layer Brian C. Lee, Edward Douglas 1989-03-07
4621042 Absorptive planarizing layer for optical lithography James J. Di Piazza 1986-11-04
4612270 Two-layer negative resist Paula M. Holder 1986-09-16
4609614 Process of using absorptive layer in optical lithography with overlying photoresist layer to form relief pattern on substrate Ahmad Hasan Khan, James John DiPiazza 1986-09-02
4550069 Positive photoresist compositions with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate 1985-10-29
4405776 Positive radiation sensitive resist terpolymer from omega alkynoic acid Kurt B. Kilichowski 1983-09-20
4401775 Epoxy encapsulating formulation Sidney S. Seffren 1983-08-30
4398660 Method of mounting electronic components Anthony Miller 1983-08-16
4393160 Aqueous developable poly(olefin sulfone) terpolymers 1983-07-12
4389433 Sulfur dioxide cured coatings 1983-06-21
4357369 Method of plasma etching a substrate Kurt B. Kilichowski 1982-11-02
4355094 Positive radiation sensitive resist terpolymers Kurt B. Kilichowski 1982-10-19
4341861 Aqueous developable poly(olefin sulfone) terpolymers 1982-07-27
4330671 Positive resist for electron beam and x-ray lithography and method of using same 1982-05-18
4263385 Method for the manufacture of multi-color microlithographic displays 1981-04-21
4262073 Positive resist medium and method of employing same Emil J. Gavalchin 1981-04-14
4262083 Positive resist for electron beam and x-ray lithography and method of using same Nitin V. Desai, Eugene S. Poliniak 1981-04-14