Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5143814 | Positive photoresist compositions with o-quinone diazide, novolak and propylene glycol alkyl ether acetate | — | 1992-09-01 |
| 5066561 | Method for producing and using a positive photoresist with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate | — | 1991-11-19 |
| 4810619 | Photolithography over reflective substrates comprising a titanium nitride layer | Brian C. Lee, Edward Douglas | 1989-03-07 |
| 4621042 | Absorptive planarizing layer for optical lithography | James J. Di Piazza | 1986-11-04 |
| 4612270 | Two-layer negative resist | Paula M. Holder | 1986-09-16 |
| 4609614 | Process of using absorptive layer in optical lithography with overlying photoresist layer to form relief pattern on substrate | Ahmad Hasan Khan, James John DiPiazza | 1986-09-02 |
| 4550069 | Positive photoresist compositions with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate | — | 1985-10-29 |
| 4405776 | Positive radiation sensitive resist terpolymer from omega alkynoic acid | Kurt B. Kilichowski | 1983-09-20 |
| 4401775 | Epoxy encapsulating formulation | Sidney S. Seffren | 1983-08-30 |
| 4398660 | Method of mounting electronic components | Anthony Miller | 1983-08-16 |
| 4393160 | Aqueous developable poly(olefin sulfone) terpolymers | — | 1983-07-12 |
| 4389433 | Sulfur dioxide cured coatings | — | 1983-06-21 |
| 4357369 | Method of plasma etching a substrate | Kurt B. Kilichowski | 1982-11-02 |
| 4355094 | Positive radiation sensitive resist terpolymers | Kurt B. Kilichowski | 1982-10-19 |
| 4341861 | Aqueous developable poly(olefin sulfone) terpolymers | — | 1982-07-27 |
| 4330671 | Positive resist for electron beam and x-ray lithography and method of using same | — | 1982-05-18 |
| 4263385 | Method for the manufacture of multi-color microlithographic displays | — | 1981-04-21 |
| 4262073 | Positive resist medium and method of employing same | Emil J. Gavalchin | 1981-04-14 |
| 4262083 | Positive resist for electron beam and x-ray lithography and method of using same | Nitin V. Desai, Eugene S. Poliniak | 1981-04-14 |