FZ

Fan Zhong

QU Qualcomm: 15 patents #1,425 of 12,104Top 15%
LM Lightwave Microsystems: 9 patents #3 of 52Top 6%
Microsoft: 2 patents #17,506 of 40,388Top 45%
BG Basell Polyolefine Gmbh: 1 patents #272 of 517Top 55%
WC Wuhan Jingce Electronic Group Co.: 1 patents #15 of 25Top 60%
NE Neophotonics: 1 patents #62 of 94Top 70%
BS Beijing Lenovo Software: 1 patents #181 of 493Top 40%
LL Lenovo (Beijing) Limited: 1 patents #602 of 1,308Top 50%
Overall (All Time): #80,563 of 4,157,543Top 2%
39
Patents All Time

Issued Patents All Time

Showing 26–39 of 39 patents

Patent #TitleCo-InventorsDate
7719754 Multi-thickness layers for MEMS and mask-saving sequence for same Sapna Patel 2010-05-18
7704773 MEMS devices having support structures with substantially vertical sidewalls and methods for fabricating the same Lior Kogut, Chengbin Qiu, Chun-Ming Wang, Stephen Zee 2010-04-27
7652814 MEMS device with integrated optical element Chun-Ming Wang, Stephen Zee 2010-01-26
7609917 Method and apparatus for controlling waveguide birefringence by selection of a waveguide core width for a top cladding Farnaz Parhami, Liang Zhao 2009-10-27
7372121 GeBPSG top clad for a planar lightwave circuit Michael Lennon 2008-05-13
7182878 Methods for etch loading planar lightwave circuits Jongik Won, Calvin Ho, Liang Zhao 2007-02-27
7160746 GeBPSG top clad for a planar lightwave circuit Michael Lennon 2007-01-09
6850670 Method and apparatus for controlling waveguide birefringence by selection of a waveguide core width for a top clad Farnaz Parhami, Liang Zhao 2005-02-01
6826345 Top cap process for reducing polarization dependent wavelength shift in planar lightwave circuits Farnaz Parhami, Zhigang Zhou 2004-11-30
6705124 High-density plasma deposition process for fabricating a top clad for planar lightwave circuit devices Jonathan Bornstein 2004-03-16
6690025 Devices for etch loading planar lightwave circuits Jongik Won, Calvin Ho, Liang Zhao 2004-02-10
6615615 GePSG core for a planar lightwave circuit Jonathan Bornstein 2003-09-09
6553170 Method and system for a combination of high boron and low boron BPSG top clad fabrication process for a planar lightwave circuit Kangjie Li 2003-04-22
6542687 Reducing polarization dependent loss caused by polarization dependent wavelength shift using core over-etch for planar lightwave circuit fabrication Jongik Won, Farnaz Parhami, Nizar S. Kheraj 2003-04-01