Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11624244 | Connecting structure for drill collar of logging while drilling instrument and drill collar sub male and female joints | Yongren Feng, Zhongli Bao, Qiang Yu, Xiaofei Qin, Lin-Chung Huang +2 more | 2023-04-11 |
| 11561803 | Systems and methods for editing topology of a reconfigurable data processor | Gregory F. Grohoski | 2023-01-24 |
| 11028658 | Horizontal-to-vertical drilling module for deep well | Yongren Feng, Tiemin Liu, Xingfang Wu, Xiaodong Chu, Zhibin Tian +4 more | 2021-06-08 |
| 10381899 | Sidewall coring structure directly driven by an electric motor | Yongren Feng, Jian Li | 2019-08-13 |
| 9099500 | Programmable array of silicon nanowire field effect transistor and method for fabricating the same | Ru Huang, Runsheng Wang, Jiewen Fan, Changze Liu, Yangyuan Wang | 2015-08-04 |
| 9034702 | Method for fabricating silicon nanowire field effect transistor based on wet etching | Ru Huang, Jiewen Fan, Yujie Ai, Shuai Sun, Runsheng Wang +1 more | 2015-05-19 |
| 9018968 | Method for testing density and location of gate dielectric layer trap of semiconductor device | Ru Huang, Changze Liu, Runsheng Wang, Jiewen Fan, Yangyuan Wang | 2015-04-28 |
| 8866507 | Method for testing trap density of gate dielectric layer in semiconductor device having no substrate contact | Ru Huang, Runsheng Wang, Jiewen Fan, Changze Liu, Yangyuan Wang | 2014-10-21 |
| 8592276 | Fabrication method of vertical silicon nanowire field effect transistor | Ru Huang, Jiewen Fan, Yujie Ai, Shuai Sun, Runsheng Wang +1 more | 2013-11-26 |
| 8564031 | High voltage-resistant lateral double-diffused transistor based on nanowire device | Ru Huang, Runsheng Wang, Gengyu Yang, Yujie Ai, Jiewen Fan | 2013-10-22 |