Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Copper-based metal polishing solution and method for manufacturing semiconductor device

Copper-based metal polishing solution and method for manufacturing semiconductor device

US Patent RE37786 · Granted Jul 9, 2002

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Film formation apparatus2025
Nano metal compound particles, coating material and film using the same, method 2024
Photon counting radiation detector and radiographic inspection device using the 2024
Substrate processing method and substrate processing apparatus2024
Semiconductor solid state battery2023
Semiconductor light-emitting element2021
Semiconductor light-emitting element and method for manufacturing same2021
Hydrogen production apparatus and hydrogen production system2021
Method for manufacturing ceramic circuit board2021
Photon counting-type radiation detector and radiological inspection device using2021
Hydrogen production apparatus and hydrogen production system2020
Processing apparatus, processing method, and manufacturing method of electronic 2019