Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Sampling method and apparatus applied to OPC of lithography layout

Sampling method and apparatus applied to OPC of lithography layout

US Patent 9978134 · Granted May 22, 2018

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Carrier reconstruction method for eliminating DC and low-frequency circulating c2025
Reciprocating rotary CVD equipment and application method2025
Chemical vapor deposition device capable of reciprocating rotation and lifting2025
Single vector-based finite control set model predictive control method of two pa2023
Pattern sorting method used in OPC verification2019
Pattern sorting method used in OPC verification2019
Method of identifying repeating design cells2018
Method of identifying repeating design cells2018
Methods for forming silicon comprising films using hexachlorodisilane in a singl2005
Emissivity-change-free pumping plate kit in a single wafer chamber2004
High temperature filter for CVD apparatus2003
CVD ruthenium seed for CVD ruthenium deposition2002