Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Plasma processing member, deposition apparatus including the same, and depositing method using the same

Plasma processing member, deposition apparatus including the same, and depositing method using the same

US Patent 9963783 · Granted May 8, 2018

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Bounding box estimation and object detection2025
Multilayer electronic component2025
Method of forming plasma-resistant coating layer with low brightness using heat 2025
Spatial property or color implementation property measurement device of holograp2025
Holographic microscope2025
Holographic image sensor2025
Digital holographic microscope robust to external environment2025
Diamine, polymer and film produced using the same2025
Multilayer electronic component2025
Semiconductor device2025
Diamine compound, polyimide precursor and polyimide prepared by using the same, 2024
Semiconductor device2024