Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Processing system and method for providing a heated etching solution

Processing system and method for providing a heated etching solution

US Patent 9911631 · Granted Mar 6, 2018

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Substrate scanning apparatus with pendulum and rotatable substrate holder2025
Pressure control strategies to provide uniform treatment streams in the manufact2023
Magnetic integrated lift pin system for a chemical processing chamber2023
Treatment systems with repositionable nozzle useful in the manufacture of microe2022
Pressure control strategies to provide uniform treatment streams in the manufact2022
Magnetically levitated and rotated chuck for processing microelectronic substrat2021
Systems and methods for metering a dose volume of fluid used to treat microelect2018
Processing system and method for providing a heated etching solution2017
Processing system and method for providing a heated etching solution2017
Method of substrate temperature control during high temperature wet processing2016
Method of using separate wafer contacts during wafer processing2016
Advanced process control for low variation treatment in immersion processing2007