Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Device and method for positioning a photolithography mask by a contactless optical method

Device and method for positioning a photolithography mask by a contactless optical method

US Patent 9897927 · Granted Feb 20, 2018

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Device and method for imaging and interferometry measurements2024
Method and device for measuring interfaces of an optical element2023
Method for 2D/3D inspection of an object such as a wafer2019
Device and method for making dimensional measurements on multilayer objects such2018
Method and device for controllably revealing structures buried in objects such a2018
Device and method for surface profilometry for the control of wafers during proc2018
Chromatic confocal device and method for 2D/3D inspection of an object such as a2017
Chromatic confocal device and method for 2D/3D inspection of an object such as a2016
Optical device and method for inspecting structured objects2015
Substrate processing apparatus for processing substrates using dense phase gas a2006
Substrate processing apparatus for processing substrates using dense phase gas a2005