Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for hotspot detection and ranking of a lithographic mask

Method for hotspot detection and ranking of a lithographic mask

US Patent 9874821 · Granted Jan 23, 2018

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Wafer image denoising and contour extraction for manufacturing process calibrati2025
Method for de-noising an electron microscope image2025
Sensitivity improvement of optical and SEM defection inspection2024
Metrology method for a semiconductor manufacturing process2020
Method for producing a pattern of features by lithography and etching2020
Methods for detecting defects of a lithographic pattern2020
Methods for detecting defects of a lithographic pattern2020
Metrology method for a semiconductor manufacturing process2020
Method and apparatus for semiconductor manufacturing2019
Method for verifying a pattern of features printed by a lithography process2018
Method for verifying a pattern of features printed by a lithography process2018
Method for inspecting a pattern of features on a semiconductor die2018