Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Cleaning fluid for semiconductor, and cleaning method using the same

Cleaning fluid for semiconductor, and cleaning method using the same

US Patent 9834745 · Granted Dec 5, 2017

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Film-forming composition2025
Composition for resist pattern metallization process2025
Method for producing a lithography coating film forming-composition2025
Method for producing coating film-forming composition for lithography2024
Coating composition for pattern inversion2024
Silicon-containing coating agent for pattern reversal2023
Method for producing resist pattern coating composition with use of solvent repl2022
Film forming composition containing fluorine-containing surfactant2022
Film forming composition containing fluorine-containing surfactant2022
Substrate treating composition and method for fabricating a semiconductor device2022
Planarization method for a semiconductor substrate using a silicon-containing co2021
Silicon-containing EUV resist underlayer film-forming composition containing oni2020