Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Imprint pattern guided self-assembly of lamellar block copolymer for BPM

Imprint pattern guided self-assembly of lamellar block copolymer for BPM

US Patent 9773520 · Granted Sep 26, 2017

Estimated economic value: $11,746,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Duodenum built-in jejunum cannula releasing system and a use method therefor2025
Frequency selective coupler2025
Data packet routing method and apparatus2024
Methods of manufacturing at least a portion of a magnetic layer of a magnetic re2024
Methods of manufacturing at least a portion of a magnetic layer of a magnetic re2024
Methods of manufacturing at least a portion of a magnetic layer of a magnetic re2024
Method to fabricate a nanochannel for DNA sequencing based on narrow trench patt2023
Method to fabricate a nanochannel for DNA sequencing based on narrow trench patt2023
High-flux efficiency filter fabrication using a flip bond process with supportiv2023
High-flux efficiency filter fabrication using a flip bond process with supportiv2023
High-flux efficiency filter fabrication using a flip bond process with supportiv2023
Fabrication of a nanochannel for DNA sequencing using electrical plating to achi2023