Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Crystallization method for oxide semiconductor layer, semiconductor device manufactured using the same, and method for manufacturing the semiconductor device

Crystallization method for oxide semiconductor layer, semiconductor device manufactured using the same, and method for manufacturing the semiconductor device

US Patent 9735281 · Granted Aug 15, 2017

Estimated economic value: $32,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Coil component2025
Imidazopyridine derivative compounds and use of same2025
Gadolinium-based compound, method for producing same, and MRI contrast agent con2025
Semiconductor device for generating an internal voltage2025
Test apparatus for image sensor package2025
Negative electrode active material for lead storage battery and Pb/C battery, pr2025
Test apparatus for testing a mobile AP2025
Backlight unit, display device and driving method2025
Catalyst-supported organic-inorganic hybrid composite particles capable of regul2025
Test apparatus for a semiconductor package2025
Vehicle body side structure2025
Method of manufacturing a probe tip and a probe tip manufactured by the same2025