Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Multiple phase-shift photomask and semiconductor manufacturing method

Multiple phase-shift photomask and semiconductor manufacturing method

US Patent 9733574 · Granted Aug 15, 2017

Estimated economic value: $7,315,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Initial signal generator, display panel and display method thereof, and display 2025
Adapter for a low intermodulation board-to-board RF coaxial connection assembly2025
Display substrate and manufacturing method therefor, and display device2025
Affective computing method for interactive robot, and related device2025
Pulse width modulation method, pulse width modulation module, and display device2025
Display module and method for driving same, and display device2025
Light-emitting diode chip and method for manufacturing the same2025
Method for adjusting gamma voltage of display module2025
Display panel and method for preparing same, and display device2025
Semiconductor device and light-emitting system2024
Method for extracting and separating dihydromyricetin from rattan tea2024
Display panel and display device2024