Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Charged particle lithography system and beam generator

Charged particle lithography system and beam generator

US Patent 9653261 · Granted May 16, 2017

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Aberration correction in charged particle system2025
Aberration correction in charged particle system2025
Charged particle blocking element, exposure apparatus comprising such an element2025
Vacuum chamber arrangement for charged particle beam generator2024
Vacuum chamber arrangement for charged particle beam generator2024
Charged particle blocking element, exposure apparatus comprising such an element2023
Vacuum chamber arrangement for charged particle beam generator2023
Vacuum chamber arrangement for charged particle beam generator2023
Aberration correction in charged particle system2022
Aberration correction in charged particle system2022
Charged particle blocking element, exposure apparatus comprising such an element2021
Vacuum chamber arrangement for charged particle beam generator2021