Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Block copolymer self-assembly for pattern density multiplication and rectification

Block copolymer self-assembly for pattern density multiplication and rectification

US Patent 9626996 · Granted Apr 18, 2017

Estimated economic value: $36,882,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Atmospheric water harvester having subcooler heat exchanger2025
Low dew point air dehumidification system2025
Atmospheric water harvester with high efficiency, and methods of using thereof2025
Back side illuminated image sensor device with select dielectric layers on the b2025
Heat pump-based water harvesting systems2025
Image sensor device2025
Atmospheric water harvesting system2025
Back side illuminated image sensor device with select dielectric layers on the b2025
Duodenum built-in jejunum cannula releasing system and a use method therefor2025
Optical fingerprint sensor with enhanced anti-counterfeiting features2025
Frequency selective coupler2025
Stacked image sensors and methods of formation2025