Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

US Patent 9594310 · Granted Mar 14, 2017

Estimated economic value: $4,776,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and apparatus for design of a metrology target2025
Membrane for EUV lithography2025
Cooling hood for reticle2025
Metrology method, target and substrate2025
Metrology method, target and substrate2025
Component for use in a lithographic apparatus, method of protecting a component 2025
Patterning device conditioning system and method2025
Lithographic system provided with a deflection apparatus for changing a trajecto2025
Method for applying a deposition model in a semiconductor manufacturing process2025
Oxygen-loss resistant top coating for optical elements2025
EUV collector mirror2025
Substrate comprising a target arrangement, and associated at least one patternin2025