Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Chemical deposition raw material formed of ruthenium complex and method for producing the same, and chemical deposition method

Chemical deposition raw material formed of ruthenium complex and method for producing the same, and chemical deposition method

US Patent 9556212 · Granted Jan 31, 2017

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Electronic apparatus, camera, and program for selecting features on an image2025
Chemical vapor deposition method using an organomanganese compound as a starting2024
Method for creating maximum output in gas turbine, method for creating output fo2024
Vinyl-based resin particles and method for producing same2024
Gas turbine output correcting method, control method, device for executing said 2024
Raw material for chemical deposition containing organoruthenium compound, and ch2024
Silica-including microcapsule resin particles, method for producing same, and ap2023
Composite and pneumatic tire2022
Raw material for chemical deposition containing ruthenium complex, and chemical 2022
Fluorescent resin particles and use thereof2022
Spherical polyester resin particles and method for producing same2022
Raw material for vapor deposition including organoplatinum compound and vapor de2021