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Home › Boron-containing dopant compositions, systems and methods of use thereof for improving ion beam current and performance during boron ion implantation

Boron-containing dopant compositions, systems and methods of use thereof for improving ion beam current and performance during boron ion implantation

US Patent 9548181 · Granted Jan 17, 2017

Estimated economic value: $113,057,000 ⓘ

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