Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom

Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom

US Patent 9540339 · Granted Jan 10, 2017

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Compound, resin, composition, resist pattern formation method, circuit pattern f2024
Material for lithography, production method therefor, composition for lithograph2023
Compound, resin, composition, resist pattern formation method, circuit pattern f2023
Compound, resin, resist composition or radiation-sensitive composition, resist p2023
Resist composition, method for forming resist pattern, and polyphenol compound u2022
Compound, resist composition, and method for forming resist pattern using it2022
Compound, resin, resist composition or radiation-sensitive composition, resist p2022
Material for forming underlayer film for lithography, composition for forming un2021
Material for forming underlayer film for lithography, composition for forming un2021
Compound, resin, composition, resist pattern formation method, and circuit patte2021
Compound, composition, and method for producing same, underlayer film forming ma2021
Compound, resin, material for forming underlayer film for lithography, underlaye2020