Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for manufacturing electronic device by forming a hole in a multilayer insulator film by plasma etching

Method for manufacturing electronic device by forming a hole in a multilayer insulator film by plasma etching

US Patent 9530664 · Granted Dec 27, 2016

Estimated economic value: $43,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Photoelectric conversion device and photodetection system2025
Annular member, plasma processing apparatus and plasma etching method2022
System, method, and program for estimating reduced attention state, and storage 2021
Solid-state image pickup device image pickup system using solid-state image pick2020
Motor control apparatus, sheet conveyance apparatus, and image forming apparatus2020
Motor control device, sheet conveying device, document feeding device, document 2020
Motor control apparatus, sheet conveyance apparatus, document feeding apparatus,2019
Semiconductor apparatus, system, and method of producing semiconductor apparatus2019
Plant operation support system with management of assigned resources using predi2019
Motor control apparatus, sheet conveyance apparatus, document feeding apparatus,2019
Imaging device and method of producing the same2019
Imaging device and method of producing the same2019