Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of decomposing layout for generating patterns on photomasks

Method of decomposing layout for generating patterns on photomasks

US Patent 9524362 · Granted Dec 20, 2016

Estimated economic value: $146,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Multi-channel replacement metal gate device2025
Clock control method and electronic device thereof2025
Peripheral device2025
Mouse device2025
Imprint method2024
Method of forming patterns on substrate by double nanoimprint lithography2024
Channel hiatus correction method and HDMI device2024
Video conference device2024
Method of forming a memory device2023
Method of forming a memory device2023
HDMI device and power-saving method for immediately switching HDMI ports2023
Peripheral device2023