Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Fin sidewall removal to enlarge epitaxial source/drain volume

Fin sidewall removal to enlarge epitaxial source/drain volume

US Patent 9490254 · Granted Nov 8, 2016

Estimated economic value: $3,275,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor structure with resistor and capacitor2025
Metal gate structures and methods of fabricating the same in field-effect transi2025
Semiconductor image-sensing structure and method for forming the same2025
Circuit structure with gate configuration2025
Micro light-emitting diode device2025
Semiconductor device and manufacturing method thereof2025
Micro light-emitting diode device2025
Method of forming devices with strained source/drain structures2025
Micro light-emitting diode device2025
Semiconductor device with gate2025
Micro light-emitting diode device2025
Wireless signal receiving circuit and system2025