Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Reactive curing process for semiconductor substrates

Reactive curing process for semiconductor substrates

US Patent 9431238 · Granted Aug 30, 2016

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Apparatus and method to process wafers2025
Showerhead assembly and components2025
Injector configured for arrangement within a reaction chamber of a substrate pro2025
Method of forming a vanadium nitride-containing layer2025
Method of forming a vanadium nitride-containing layer2025
Manifolds for uniform vapor deposition2025
Substrate processing apparatus and method for processing substrates2025
Substrate processing apparatus and method for processing substrates2025
Substrate processing apparatus, reactor mover for moving a reactor of the appara2025
Substrate processing apparatus, reactor mover for moving a reactor of the appara2025
Substrate susceptor using edge purging2025
Method and wafer processing furnace for forming an epitaxial stack of semiconduc2025