Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for fabricating semiconductor device including silicon-containing layer and metal-containing layer, and conductive structure of the same

Method for fabricating semiconductor device including silicon-containing layer and metal-containing layer, and conductive structure of the same

US Patent 9418891 · Granted Aug 16, 2016

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Optical system and camera module comprising same2025
Three-dimensional cell culture, devices, and use thereof2025
Method and apparatus for providing driver interface2025
Method for controlling vehicle thermal management system2025
Thermal management system for vehicle2025
Image sensor2025
Image sensor having pixels with different light receiving areas2025
Vehicle thermal management system2024
Method for controlling heating of vehicle thermal management system2024
Electronic device2024
Method for controlling heating of vehicle thermal management system2024
Electronic device2024