Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Overlay measurement method

Overlay measurement method

US Patent 9410902 · Granted Aug 9, 2016

Estimated economic value: $178,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Photomask structure2025
Method of forming a layout pattern and photomask2025
Photomask structure2025
Semiconductor structure2025
Die seal ring structure2025
Patterning method and overlay measurement method2024
Integrated circuit2022
Oil system2022
Manufacturing method of semiconductor structure2022
Fabricating method of semiconductor structure2021
Semiconductor structure2020
Method of pattern data preparation and method of forming pattern in layer2020