Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Channel cladding last process flow for forming a channel region on a FinFET device

Channel cladding last process flow for forming a channel region on a FinFET device

US Patent 9362405 · Granted Jun 7, 2016

Estimated economic value: $2,066,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Electro-optical high bandwidth ultrafast differential RAM2025
Electro-optic frequency transducer using coupled microdisk resonators2025
Magneto-electric sensor for hardware trojan detection2025
Non-volatile electro-optical high-bandwidth ultra-fast large-scale memory archit2025
ML-enabled assured microelectronics manufacturing: a technique to mitigate hardw2025
Waveguide structures2023
Fin-based photodetector structure2023
Optical fiber coupler having hybrid tapered waveguide segments and metamaterial 2023
Sensing scheme for STT-MRAM using low-barrier nanomagnets2023
Non-planar waveguide structures2023
Reconfigurable optical grating/coupler2023
Optical neuro-mimetic devices2022