Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Polishing agent, polishing method, and manufacturing method of semiconductor integrated circuit device

Polishing agent, polishing method, and manufacturing method of semiconductor integrated circuit device

US Patent 9328261 · Granted May 3, 2016

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Image processing apparatus, radiation imaging system, image processing method, a2025
Method for producing fluorine-containing polymer, aqueous dispersion liquid, and2025
Single-crystal silicon-carbide substrate and polishing solution2018
Single crystal silicon-carbide substrate and polishing solution2018
Polishing agent, polishing method, and liquid additive for polishing2017
Polishing agent, polishing method and additive liquid for polishing2016
Polishing method of non-oxide single-crystal substrate2015
Polishing agent and polishing method2015
Abrasive composition and method for manufacturing semiconductor integrated circu2012
Polishing compound for semiconductor integrated circuit device, polishing method2011
Method for producing glass substrate for magnetic disk, and magnetic disk2010
Polishing compound for semiconductor integrated circuit device, polishing method2010