{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Method for forming a silicide layer at the bottom of a hole and device for implementing said method", "item": "https://www.patentleaderboard.com/patent/9257291"}]}
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Method for forming a silicide layer at the bottom of a hole and device for implementing said method

US Patent 9257291 · Granted Feb 9, 2016

Estimated economic value: $1,538,000

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