Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of manufacturing a semiconductor device having a porous, low-k dielectric layer

Method of manufacturing a semiconductor device having a porous, low-k dielectric layer

US Patent 9224593 · Granted Dec 29, 2015

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Sustainable curtain wall2025
System and method for controlling internal temperature of vehicle when engine is2025
Semiconductor device and method of manufacturing the same2025
Semiconductor device2025
Semiconductor device2025
Stack molding machine2024
Fiber-based high repetition rate femtosecond laser source and laser processing s2024
Semiconductor device2024
Integrated circuit devices including a via and methods of forming the same2024
Semiconductor device2024
Image sensor including a protective layer2023
Semiconductor device and method of manufacturing the same2023