Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for manufacturing a group III nitride substrate using a chemical lift-off process

Method for manufacturing a group III nitride substrate using a chemical lift-off process

US Patent 9171717 · Granted Oct 27, 2015

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Alpha gallium oxide thin-film structure having high conductivity obtained using 2025
Light-responsive polypeptides and methods of use thereof2025
Manufacturing method of gallium oxide thin film for power semiconductor using do2022
Capsule type photodynamic therapy apparatus with anchor2022
Semiconductor device2021
Semiconductor device2021
Semiconductor device2020
Nitride semiconductor light-emitting device, and method for manufacturing same2020
Nitride semiconductor light-emitting device, and method for manufacturing same2020
Light-emitting diode structure, transfer assembly, and transfer method using the2019
Method of distributing application with security features and method of operatin2019
Semiconductor light emitting device2016