Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Passivation layer structure of semiconductor device and method for forming the same

Passivation layer structure of semiconductor device and method for forming the same

US Patent 9040983 · Granted May 26, 2015

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Precursor structure, lamination film of the same, and manufacturing method of io2023
Composite material and method of removing fluoride ion in waste liquid2023
Porous material and method for preparing the same2023
Ceramic composite and method of preparing the same2023
Core-shell composite material and method for manufacturing the same2021
Image sensor and manufacturing method thereof2019
Image sensor and manufacturing method thereof2019
Image sensor and manufacturing method thereof2019
Image sensor2019
Image sensor and manufacturing method thereof2018
Dehumidification system2017
Polyimide copolymers and method for fabricating patterned metal oxide layers2015