Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Apparatus and method for atomic layer deposition

Apparatus and method for atomic layer deposition

US Patent 8956456 · Granted Feb 17, 2015

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Apparatus and method for atomic layer deposition2023
Apparatus for producing an object by means of additive manufacturing2022
Optical beam homogenizer based on a lens array2021
Method and apparatus for depositing atomic layers on a substrate2020
Lithographic apparatus and method for preventing peripheral exposure of a substr2019
Method and apparatus for depositing atomic layers on a substrate2017
Apparatus and method for reactive ion etching2017
Continuous patterned layer deposition2016
Method and apparatus for depositing atomic layers on a substrate2016
Apparatus for atomic layer deposition2016
System and method for picking and placement of chip dies2015
Illumination system for use in a stereolithography apparatus2014