{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Methods to improve leakage of high K materials", "item": "https://www.patentleaderboard.com/patent/8846468"}]}
Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods to improve leakage of high K materials

Methods to improve leakage of high K materials

US Patent 8846468 · Granted Sep 30, 2014

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

High-K dielectric materials comprising zirconium oxide utilized in display devic2024
Selective in-situ cleaning of high-k films from processing chamber using reactiv2024
Hybrid high-K dielectric material film stacks comprising zirconium oxide utilize2024
High-K dielectric materials comprising zirconium oxide utilized in display devic2024
Hybrid high-k dielectric material film stacks comprising zirconium oxide utilize2023
ALD process and hardware with improved purge efficiency2023
Layer stack for display applications2023
High-k dielectric materials comprising zirconium oxide utilized in display devic2022
Hybrid high-k dielectric material film stacks comprising zirconium oxide utilize2021
Layer stack for display applications2021
ALD process and hardware with improved purge efficiency2021
Current compliance layers and memory arrays comprising thereof2020