Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of forming a pattern in a semiconductor device and method of forming a gate using the same

Method of forming a pattern in a semiconductor device and method of forming a gate using the same

US Patent 8846304 · Granted Sep 30, 2014

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

High-strength hot-rolled steel sheet having excellent bendability and low-temper2024
High-strength hot-rolled steel sheet having excellent bendability and low-temper2023
Electronic device2019
Semiconductor memory with reduced contact margin2017
Method of forming a pattern in a semiconductor device and method of forming a ga2015
Method of forming a pattern in a semiconductor device and method of forming a ga2015
Semiconductor device and method for fabricating the same, and microprocessor, pr2015
Nitride semiconductor and fabricating method thereof2015
Semiconductor device having decoupling capacitors and dummy transistors2015
Method of forming a pattern in a semiconductor device and method of forming a ga2013
Method of forming a pattern in a semiconductor device and method of forming a ga2013
External wall panel unit for saving energy and external wall structure system us2012