Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Integration of lithography apparatus and mask optimization process with multiple patterning process

Integration of lithography apparatus and mask optimization process with multiple patterning process

US Patent 8819601 · Granted Aug 26, 2014

Estimated economic value: $4,412,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Device for dosing particulate material2025
Method and system for positioning and correcting visual data by seafloor topogra2025
Board creasing and cutting apparatus and method for producing packaging box2024
Device for assembling and processing plate heat exchanger of power battery2023
Three-dimensional mask model for photolithography simulation2022
Three-dimensional mask model for photolithography simulation2022
Trench MOSFET and method of manufacturing trench MOSFET2022
Voltage measurement method and apparatus2022
Method of performing model-based scanner tuning2022
Fast freeform source and mask co-optimization method2021
Fast freeform source and mask co-optimization method2021
Methods and systems for parameter-sensitive and orthogonal gauge design for lith2020