Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for etching polycrystalline silicon, method for manufacturing semiconductor device, and etching program

Method for etching polycrystalline silicon, method for manufacturing semiconductor device, and etching program

US Patent 8716137 · Granted May 6, 2014

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Mirror support mechanism and optical device2024
4-methyldihydropyrimidinone compounds and pharmaceutical use thereof2021
Method for producing 7h-pyrrolo[2, 3-d]pyrimidine derivative and intermediate th2020
Manufacturing method of purified 1-chloro-2,3,3,3-Tetrafluoropropene and purifie2019
Blowby gas treatment device for internal combustion engine with supercharger2019
Electronic device2018
Electronic device2015
Power semiconductor device having a thin gate insulating film with high-k dielec2014
Amide compound and medicinal use thereof2013
Edge detection method for transparent substrate by detecting non-light-emitting 2012
Push button switch device2011
Pushbutton switch device2011