Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Device for forming a film by deposition from a plasma

Device for forming a film by deposition from a plasma

US Patent 8635972 · Granted Jan 28, 2014

Estimated economic value: $93,219,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Apparatus and method for patterned processing2023
Opto-electronic device with textured surface and method of manufacturing thereof2020
Photovoltaic module including a transparent conductive electrode having a variab2018
Method for the low-temperature production of radial-junction semiconductor nanos2018
Method and apparatus for forming a film by deposition from a plasma2014
Method and apparatus for forming a film by deposition from a plasma2014
Method and apparatus for forming a film by deposition from a plasma2014
Method and apparatus for forming a film by deposition from a plasma2014
Method and apparatus for forming a film by deposition from a plasma2014
Method and apparatus for forming a film by deposition from a plasma2014
Method for making side growth semiconductor nanowires and transistors obtained b2014
Method of texturing the surface of a silicon substrate, and textured silicon sub2013