Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Polymers, photoresist compositions and methods of forming photolithographic patterns

Polymers, photoresist compositions and methods of forming photolithographic patterns

US Patent 8614050 · Granted Dec 24, 2013

Estimated economic value: $35,960,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Separator with organic/inorganic porous coating layer for electrochemical device2025
Growth inhibitor for forming thin film, method of forming thin film using growth2025
Webserver-based video content production system and method for printing holograp2025
Process liquid composition for lithography and pattern forming method using same2025
Measuring device and measuring method2025
Polypeptide having antibacterial activity, composition for preventing or treatin2025
Porous separator and electrochemical device including the same2025
Separator for electrochemical device and an electrochemical device including sam2025
Slurry composition for polishing silicon oxide film, and polishing method using 2025
Method for analyzing silicon concentration in phosphoric acid solution2025
Separator for an electrochemical device including a porous organic/inorganic com2025
Electrochemical device separator including porous organic/inorganic composite co2025