Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Machine and process for sequential multi-sublayer deposition of copper indium gallium diselenide compound semiconductors

Machine and process for sequential multi-sublayer deposition of copper indium gallium diselenide compound semiconductors

US Patent 8465589 · Granted Jun 18, 2013

Estimated economic value: $899,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Array of monolithically integrated thin film photovoltaic cells and associated m2018
Array of monolithically integrated thin film photovoltaic cells and associated m2018
Array of monolithically integrated thin film photovoltaic cells and associated m2018
Brain cooling system2017
Hybrid multi-junction photovoltaic cells and associated methods2017
Hybrid multi-junction photovoltaic cells and associated methods2016
Array of monolithically integrated thin film photovoltaic cells and associated m2014
Array of monolithically integrated thin film photovoltaic cells and associated m2014
Array of monolithically integrated thin film photovoltaic cells and associated m2014
Machine and process for sequential multi-sublayer deposition of copper indium ga2011
Machine and process for sequential multi-sublayer deposition of copper indium ga2011
Machine and process for sequential multi-sublayer deposition of copper indium ga2011