Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Process for post contact-etch clean

Process for post contact-etch clean

US Patent 8399360 · Granted Mar 19, 2013

Estimated economic value: $4,641,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods of forming features2019
Methods of forming features2017
Electroactivated film with electrocatalyst-enhanced carbon electrode2011
Method of forming borderless contacts2011
Method of forming borderless contacts2011
Electroactivated film with polymer gel electrolyte2010
Functionalized nanotube material for supercapacitor electrodes2008
Removing whisker defects2008
Methods for cleaning contact openings to reduce contact resistance2007