Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for determining the junction depth of a semiconductor region

Method and apparatus for determining the junction depth of a semiconductor region

US Patent 8384904 · Granted Feb 26, 2013

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and apparatus for measuring a lateral depth in a microstructure2025
Method for differential heating of elongate nano-scaled structures2018
Method for determining the doping profile of a partially activated doped semicon2014
Method for determining the active doping concentration of a doped semiconductor 2014
Method for determining an active dopant concentration profile2014
Method and device to quantify active carrier profiles in ultra-shallow semicondu2010