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Home › Efficient and accurate method for real-time prediction of the self-bias voltage of a wafer and feedback control of ESC voltage in plasma processing chamber

Efficient and accurate method for real-time prediction of the self-bias voltage of a wafer and feedback control of ESC voltage in plasma processing chamber

US Patent 8313664 · Granted Nov 20, 2012

Estimated economic value: $4,897,000 ⓘ

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