Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Insitu post atomic layer deposition destruction of active species

Insitu post atomic layer deposition destruction of active species

US Patent 8257497 · Granted Sep 4, 2012

Estimated economic value: $3,763,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Pitch reduction technology using alternating spacer depositions during the forma2025
Pitch reduction technology using alternating spacer depositions during the forma2024
Vapor deposition of molybdenum using a bis(alkyl-arene) molybdenum precursor2023
Pitch reduction technology using alternating spacer depositions during the forma2022
Processing of semiconductors using vaporized solvents2022
CVD Mo deposition by using MoOCl42021
Air leak detection in plasma processing apparatus with separation grid2021
Vertical resistor adjacent inactive gate over trench isolation2021
Tapered fin-type field-effect transistors2020
Pitch reduction technology using alternating spacer depositions during the forma2020
Hybrid fin cut with improved fin profiles2020
Resistor within single diffusion break, and related method2019