Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Iron silicide sputtering target and method for production thereof

Iron silicide sputtering target and method for production thereof

US Patent 8173093 · Granted May 8, 2012

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Image forming apparatus with improved uniformity of heat at the nip of its fixin2025
Information providing system, information providing method and recording medium2025
Copper powder, method for manufacturing copper powder, and method for manufactur2025
Early abnormality detection based on frequency-inverse document frequency vector2025
Image forming apparatus and information processing device2025
Potassium sodium niobate sputtering target and production method thereof2025
Manufacturing method of porous silicon material, porous silicon material, and po2024
Motor control device2024
Work tool2024
Mobile haptic robots2024
Conference device2024
Remote controller2024