Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith

Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith

US Patent 8158568 · Granted Apr 17, 2012

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Cleaning composition, cleaning method, and method for manufacturing semiconducto2022
Processing method and processing apparatus2016
Surface treatment liquid, surface treatment method, hydrophobilization method, a2016
Method of forming resist pattern and negative resist composition2014
Laser machining device and bellows device2014
Photoresist stripping solution and a method of stripping photoresists using the 2014
Photoresist stripping solution and a method of stripping photoresists using the 2014
Cleaning liquid used in photolithography and a method for treating substrate the2014
Cleaning liquid used in photolithography and a method for treating substrate the2014
Process control apparatus and laser processing apparatus2014
Detergent for lithography and method of forming resist pattern with the same2013
Method for stripping photoresist2013